TCO ----- Fraunhofer IST Szyszka group

Results found: 27
Sum of the Times Cited : 214 View
View without self-citations
Average Citations per Item : 7.93
h-index : 8

://www.ist.fraunhofer.de/english/competencies/function/transparent/frames.html

particular technical relevance are the TCO systems SnO2:Sb, ZnO:In and ZnO:Al produced by the reactive sputtering of doped, metallic targets. Especially high-grade coating properties can be achieved by the reactive MF magnetron sputtering of ZnO:Al:
Low specific coating resistance (r < l =" 380...780">

1.
Jager S, Szyszka B, Szczyrbowski J, et al.

Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

SURFACE & COATINGS TECHNOLOGY 98 (1-3): 1304-1314 JAN 1998

Times Cited: 43
2.
Szyszka B

Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering

THIN SOLID FILMS 351 (1-2): 164-169 AUG 30 1999

Times Cited: 29
3.
Szyszka B, Jager S

Optical and electrical properties of doped zinc oxide films prepared by ac reactive magnetron sputtering

JOURNAL OF NON-CRYSTALLINE SOLIDS 218: 74-80 SEP 1997

Times Cited: 25
4.
Jiang X, Jia CL, Szyszka B

Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface

APPLIED PHYSICS LETTERS 80 (17): 3090-3092 APR 29 2002

Times Cited: 20
5.
Malkomes N, Vergohl M, Szyszka B

Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 19 (2): 414-419 MAR-APR 2001

Times Cited: 14
6.
Hong RJ, Jiang X, Szyszka B, et al.Studies on ZnO : Al thin films deposited by in-line reactive mid-frequency magnetron sputtering APPLIED SURFACE SCIENCE 207 (1-4): 341-350 FEB 28 2003 Times Cited: 13
7.
Szyszka B, Sittinger V, Jiang X, et al.Transparent and conductive ZnO : Al films deposited by large area reactive magnetron sputtering THIN SOLID FILMS 442 (1-2): 179-183 OCT 1 2003 Times Cited: 9
8.
Muller J, Schope G, Kluth O, et al.

State-of-the-art mid-frequency sputtered ZnO films for thin film silicon solar cells and modules

THIN SOLID FILMS 442 (1-2): 158-162 OCT 1 2003

Times Cited: 8
9.
Hong RJ, Jiang X, Szyszka B, et al.

Comparison of the ZnO : Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering

JOURNAL OF CRYSTAL GROWTH 253 (1-4): 117-128 JUN 2003

Times Cited: 7
10.
Hunsche B, Vergohl M, Neuhauser H, et al.

Effect of deposition parameters on optical and mechanical properties of MF- and DC-sputtered Nb2O5 films

THIN SOLID FILMS 392 (2): 184-190 JUL 30 2001

Times Cited: 7