TCO niuniu in my eyes (1) ---- K. Ellmer
Results found:60 Sum of the Times Cited :819 Average Citations per Item : 13.65 h-index :17
In my eyes, Dr. Klauss Ellmer is one of admiring scientists in the area of TCO (transparent conducting oxide) films, especially Al-doped ZnO films (AZO) by magnetron sputtering. Now he work in the solar energy division of Hahn-Meitner-Institut Berlin as a senior researcher. According to the statistic of ISI web index (up to 2006), he authored only 17 papers about AZO films in the last decade. However, the total of cited number is over 340 times, approximately 20 times per paper. Maybe somebody think that the number is just so so, but it is considerable if we take into account that the research on AZO films by magnetron sputtering has been intensively carried out by numerous groups, and not achieved a great breach in the last two decades.
His main contribution to this field is correlating the plasma parameters with the microstructure, electrical, and optical properties and having a systemtic investigation on AZO films using this method. We often found that the results of diffirent authors in the literature conflicted each other even though they used the same preparation method, same external parameters. This make us lost! and it is difficult to make a clear and reliable correlation between the process conditions and film properties. Therefore, his approach, probably inspired from the classic work on TiN coatings by Petrov group (another pioneer i admired will be introduced in later articles ), is more insightful and necessary for a better understanding of TCO materials.
In the last years such an approach was reported only on few papers, in order to achieve further progress in understanding and reproducibly produce TCO films, the interplay between the microparameters (plasma parameters, not only external parameters) and film quality has to be investigated much more in detail.
P. S. : Partial representative papers:
1. Cebulla R, Wendt R, Ellmer K Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties JOURNAL OF APPLIED PHYSICS 83 (2): 1087-1095 JAN 15 1998 Times Cited: 67
2. Ellmer K Resistivity of polycrystalline zinc oxide films: current status and physical limit JOURNAL OF PHYSICS D-APPLIED PHYSICS 34 (21): 3097-3108 NOV 7 2001 Times Cited: 51
3. Ellmer KMagnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties JOURNAL OF PHYSICS D-APPLIED PHYSICS 33 (4): R17-R32 FEB 21 2000 Times Cited: 51
4. ELLMER K, KUDELLA F, MIENTUS R, et al.INFLUENCE OF DISCHARGE PARAMETERS ON THE LAYER PROPERTIES OF REACTIVE MAGNETRON-SPUTTERED ZNO-AL FILMS THIN SOLID FILMS 247 (1): 15-23 JUL 1 1994 Times Cited: 44
5. Hinze J, Ellmer KIn situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering JOURNAL OF APPLIED PHYSICS 88 (5): 2443-2450 SEP 1 2000 Times Cited: 25
2. Ellmer K Resistivity of polycrystalline zinc oxide films: current status and physical limit JOURNAL OF PHYSICS D-APPLIED PHYSICS 34 (21): 3097-3108 NOV 7 2001 Times Cited: 51
3. Ellmer KMagnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties JOURNAL OF PHYSICS D-APPLIED PHYSICS 33 (4): R17-R32 FEB 21 2000 Times Cited: 51
4. ELLMER K, KUDELLA F, MIENTUS R, et al.INFLUENCE OF DISCHARGE PARAMETERS ON THE LAYER PROPERTIES OF REACTIVE MAGNETRON-SPUTTERED ZNO-AL FILMS THIN SOLID FILMS 247 (1): 15-23 JUL 1 1994 Times Cited: 44
5. Hinze J, Ellmer KIn situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering JOURNAL OF APPLIED PHYSICS 88 (5): 2443-2450 SEP 1 2000 Times Cited: 25
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